Description
This course introduces students to the process flow and design methodology for integrated systems fabrication. The course highlights the basic unit processes of micro and nano systems fabrication: deposition, paderning, and etching. Students are exposed to examples from: Semiconductor device fabrication; MicroElectroMechanical systems (MEMS) fabrication; Magnetic device fabrication, and optical device fabrication. Labs allow the students to design, fabricate and test an integrated device.
